JPH0248090B2 - - Google Patents

Info

Publication number
JPH0248090B2
JPH0248090B2 JP62131848A JP13184887A JPH0248090B2 JP H0248090 B2 JPH0248090 B2 JP H0248090B2 JP 62131848 A JP62131848 A JP 62131848A JP 13184887 A JP13184887 A JP 13184887A JP H0248090 B2 JPH0248090 B2 JP H0248090B2
Authority
JP
Japan
Prior art keywords
light
light beam
lens
illumination
elliptical mirror
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62131848A
Other languages
English (en)
Japanese (ja)
Other versions
JPS63113412A (ja
Inventor
Yoshiaki Mimura
Kazue Yoshida
Kunio Konno
Nobuya Shinoyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Nippon Telegraph and Telephone Corp
Original Assignee
Nikon Corp
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp, Nippon Telegraph and Telephone Corp filed Critical Nikon Corp
Priority to JP62131848A priority Critical patent/JPS63113412A/ja
Publication of JPS63113412A publication Critical patent/JPS63113412A/ja
Publication of JPH0248090B2 publication Critical patent/JPH0248090B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Microscoopes, Condenser (AREA)
  • Light Sources And Details Of Projection-Printing Devices (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP62131848A 1987-05-29 1987-05-29 マスク照明光学系 Granted JPS63113412A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62131848A JPS63113412A (ja) 1987-05-29 1987-05-29 マスク照明光学系

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62131848A JPS63113412A (ja) 1987-05-29 1987-05-29 マスク照明光学系

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP15874079A Division JPS5681813A (en) 1979-12-08 1979-12-08 Mask lighting optical system

Publications (2)

Publication Number Publication Date
JPS63113412A JPS63113412A (ja) 1988-05-18
JPH0248090B2 true JPH0248090B2 (en]) 1990-10-24

Family

ID=15067524

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62131848A Granted JPS63113412A (ja) 1987-05-29 1987-05-29 マスク照明光学系

Country Status (1)

Country Link
JP (1) JPS63113412A (en])

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6885433B2 (en) 1990-11-15 2005-04-26 Nikon Corporation Projection exposure apparatus and method
US6897942B2 (en) 1990-11-15 2005-05-24 Nikon Corporation Projection exposure apparatus and method
US6967710B2 (en) 1990-11-15 2005-11-22 Nikon Corporation Projection exposure apparatus and method

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2696360B2 (ja) * 1988-10-28 1998-01-14 旭光学工業株式会社 照明光学装置
US5121160A (en) * 1989-03-09 1992-06-09 Canon Kabushiki Kaisha Exposure method and apparatus

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6885433B2 (en) 1990-11-15 2005-04-26 Nikon Corporation Projection exposure apparatus and method
US6897942B2 (en) 1990-11-15 2005-05-24 Nikon Corporation Projection exposure apparatus and method
US6967710B2 (en) 1990-11-15 2005-11-22 Nikon Corporation Projection exposure apparatus and method

Also Published As

Publication number Publication date
JPS63113412A (ja) 1988-05-18

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